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Jean-Paul Booth. Published 92 articles in journals. Works in the area(s) of Exact Sciences with emphasis on Physical Sciences with emphasis on Fluids and Plasma Physics. In his curriculum Ciência Vitae the most frequent terms in the context of scientific, technological and artistic-cultural output are: Plasma Diagnostics; Laser Spectroscopy; Radiofrequency plasmas; .
Identificação

Identificação pessoal

Nome completo
Jean-Paul Booth

Nomes de citação

  • Booth, Jean-Paul

Identificadores de autor

Ciência ID
9810-E68D-FC9A
ORCID iD
0000-0002-0980-3278

Telefones

Telefone
  • (+33) 169335902 (Profissional)

Moradas

  • LPP, Ecole Polytechnique, 91120, Essonne, Palaiseau, França (Profissional)

Websites

Domínios de atuação

  • Ciências Exatas - Física - Física dos Fluídos e dos Plasmas
  • Ciências Exatas - Física - Física dos Fluídos e dos Plasmas

Idiomas

Idioma Conversação Leitura Escrita Compreensão Peer-review
Inglês (Idioma materno)
Francês (Idioma materno)
Formação
Grau Classificação
1985/05/01 - 1988/10/01
Concluído
 Natural Philosophy (Doctor of Philosophy)
Especialização em Physical Chemistry
University of Oxford Department of Chemistry, Reino Unido
"Laser studies of species involved in plasma etching processes" (TESE/DISSERTAÇÃO)
1980/10/01 - 1984/06/30
Concluído
 Chemistry (Bachelor)
Especialização em Chemistry
University of Oxford, Reino Unido
"Laser studies of species involved in plasma etching processes" (TESE/DISSERTAÇÃO)
Percurso profissional

Ciência

Categoria Profissional
Instituição de acolhimento 		Empregador
1990/10/01 - Atual Investigador principal (carreira) (Investigação) CNRS Délégation Ile-de-France Sud, França
Laboratoire de Physique des Plasmas, França

Outras Carreiras

Categoria Profissional
Instituição de acolhimento 		Empregador
2006/04/01 - 2008/06/30 Técnico Superior (Técnico Superior) Lam Research Corp, Estados Unidos
Lam Research Corp, Estados Unidos
Projetos

Bolsa

Designação Financiadores
2013/06/01 - 2016/06/01 ANR Blanc CLEANGRAPH
ANR-13-BS09-0019
Bolseiro de Investigação
Agence nationale de la recherche, França
 Agence nationale de la recherche
Concluído
2012/06/01 - 2014/06/01 Novel plasma processes for Carbon Alloyed NAnocrystalline Silicon TAndem (CANASTA) thin film solar cells – CANASTA
ANR-10-HABI-0002
Bolseiro de Investigação
École Nationale Polytechnique, Argélia
 Agence nationale de la recherche
Concluído

Projeto

Designação Financiadores
2018/10/01 - 2021/10/01 Diagnostics of intermediate Pressure Plasmas in oxygen
N/A
Investigador responsável
Applied Materials Corporation, Estados Unidos
 Applied Materials Corporation
Em curso
2011/10/01 - 2017/10/01 Fundamental studies of an inductiveley-coupled plasma in chlorine and oxygen gases
N/A
Investigador responsável
Applied Materials Corporation, Estados Unidos
 Applied Materials Corporation
Concluído
2009/06/01 - 2012/06/01 INCLINE
ANR-09-BLAN-0019
Bolseiro de Investigação
École Nationale Polytechnique, Argélia
 Agence nationale de la recherche
Concluído
Produções

Publicações

Artigo em revista
  1. Alexandra Brisset; Andrew R Gibson; Sandra Schröter; Kari Niemi; Jean-Paul Booth; Timo Gans; Deborah O’Connell; Erik Wagenaars. "Chemical kinetics and density measurements of OH in an atmospheric pressure He + O2 + H2O radiofrequency plasma". Journal of Physics D: Applied Physics 54 28 (2021): 285201-285201. https://doi.org/10.1088/1361-6463/abefec.
    10.1088/1361-6463/abefec
  2. J-P Booth; A Chatterjee; O Guaitella; J Santos Sousa; D Lopaev; S Zyryanov; T Rakhimova; et al. "Determination of absolute O(3P) and O2(a1 ¿ g) densities and kinetics in fully modulated O2 dc glow discharges from the O2(X3 S g -) afterglow recovery dynamics". Plasma Sources Science and Technology 29 11 (2020): 115009-115009. https://doi.org/10.1088/1361-6595/abb5e7.
    10.1088/1361-6595/abb5e7
  3. A V Volynets; D V Lopaev; T V Rakhimova; O V Proshina; A A Chukalovsky; J P Booth. "Fast quenching of metastable O2(a 1¿ g ) and O2(b 1S g +) molecules by O(3P) atoms at high temperature". Plasma Sources Science and Technology 29 11 (2020): 115020-115020. https://doi.org/10.1088/1361-6595/abbf92.
    10.1088/1361-6595/abbf92
  4. A S Morillo-Candas; C Drag; J-P Booth; T C Dias; V Guerra; O Guaitella. "Oxygen atom kinetics in CO2 plasmas ignited in a DC glow discharge". Plasma Sources Science and Technology (2019): https://doi.org/10.1088/1361-6595/ab2b84.
    10.1088/1361-6595/ab2b84
  5. J P Booth; O Guaitella; A Chatterjee; C Drag; V Guerra; D Lopaev; S Zyryanov; et al. "Oxygen (3P) atom recombination on a Pyrex surface in an O2 plasma". Plasma Sources Science and Technology (2019): https://doi.org/10.1088/1361-6595/ab13e8.
    10.1088/1361-6595/ab13e8
  6. Frederik Schmidt; Julian Schulze; Erik Johnson; Jean-Paul Booth; Douglas Keil; David M French; Jan Trieschmann; Thomas Mussenbrock. "Multi frequency matching for voltage waveform tailoring". Plasma Sources Science and Technology (2018): https://doi.org/10.1088/1361-6595/aad2cd.
    10.1088/1361-6595/aad2cd
  7. James R Hamilton; Jonathan Tennyson; Jean-Paul Booth; Timo Gans; Andrew R Gibson. "Calculated electron impact dissociation cross sections for molecular chlorine (Cl2)". Plasma Sources Science and Technology (2018): https://doi.org/10.1088/1361-6595/aada32.
    10.1088/1361-6595/aada32
  8. Yue Liu; Jean-Paul Booth; Pascal Chabert. "Effect of frequency on the uniformity of symmetrical RF CCP discharges". Plasma Sources Science and Technology (2018): https://doi.org/10.1088/1361-6595/aabfb4.
    10.1088/1361-6595/aabfb4
  9. Adriana Annušová; Daniil Marinov; Jean-Paul Booth; Nishant Sirse; Mário Lino da Silva; Bruno Lopez; Vasco Guerra. "Kinetics of highly vibrationally excited O2(X) molecules in inductively-coupled oxygen plasmas". Plasma Sources Science and Technology (2018): https://doi.org/10.1088/1361-6595/aab47d.
    10.1088/1361-6595/aab47d
  10. Yue Liu; Jean-Paul Booth; Pascal Chabert. "Plasma non-uniformity in a symmetric radiofrequency capacitively-coupled reactor with dielectric side-wall: a two dimensional particle-in-cell/Monte Carlo collision simulation". Plasma Sources Science and Technology (2018): https://doi.org/10.1088/1361-6595/aaa86e.
    10.1088/1361-6595/aaa86e
  11. Z Donkó; A Derzsi; I Korolov; P Hartmann; S Brandt; J Schulze; B Berger; et al. "Experimental benchmark of kinetic simulations of capacitively coupled plasmas in molecular gases". Plasma Physics and Controlled Fusion 60 1 (2018): 014010-014010. https://doi.org/10.1088/1361-6587/aa8378.
    10.1088/1361-6587/aa8378
  12. J Dedrick; S Schröter; K Niemi; A Wijaikhum; E Wagenaars; N de Oliveira; L Nahon; et al. "Controlled production of atomic oxygen and nitrogen in a pulsed radio-frequency atmospheric-pressure plasma". Journal of Physics D: Applied Physics 50 45 (2017): 455204-455204. https://doi.org/10.1088/1361-6463/aa8da2.
    10.1088/1361-6463/aa8da2
  13. P Diomede; B Bruneau; S Longo; E Johnson; J-P Booth. "Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: vibrational kinetics and negative ions control". Plasma Sources Science and Technology (2017): https://doi.org/10.1088%2F1361-6595%2Faa752c.
    10.1088/1361-6595/aa752c
  14. D Marinov; J-P Booth; C Drag; C Blondel. "Measurement of the isotope shift of the $2{{\rm{p}}}^{4}{}^{3}{{P}}_{2} \rightarrow 2{{\rm{p}}}^{3}3{\rm{p}}{}^{3}{{P}}_{2}$ two-photon transition of O I and a revision of the triplet energy levels of atomic oxygen". Journal of Physics B: Atomic, Molecular and Optical Physics (2017): https://doi.org/10.1088%2F1361-6455%2Faa5a88.
    10.1088/1361-6455/aa5a88
  15. Aranka Derzsi; Bastien Bruneau; Andrew Robert Gibson; Erik Johnson; Deborah O’Connell; Timo Gans; Jean-Paul Booth; Zoltán Donkó. "Power coupling mode transitions induced by tailored voltage waveforms in capacitive oxygen discharges". Plasma Sources Science and Technology 26 3 (2017): 034002-034002. https://doi.org/10.1088%2F1361-6595%2Faa56d6.
    10.1088/1361-6595/aa56d6
  16. Andrew Robert Gibson; Mickaël Foucher; Daniil Marinov; Pascal Chabert; Timo Gans; Mark J Kushner; Jean-Paul Booth. "The role of thermal energy accommodation and atomic recombination probabilities in low pressure oxygen plasmas". Plasma Physics and Controlled Fusion (2017):
    10.1088/1361-6587/59/2/024004
  17. T Lafleur; P Chabert; M M Turner; J P Booth. "Equivalence of the hard-wall and kinetic-fluid models of collisionless electron heating in capacitively coupled discharges". Plasma Sources Science and Technology 23 1 (2014): 015016-015016. https://doi.org/10.1088%2F0963-0252%2F23%2F1%2F015016.
    10.1088/0963-0252/23/1/015016
  18. T Lafleur; P Chabert; M M Turner; J P Booth. "Theory for the self-bias formation in capacitively coupled plasmas excited by arbitrary waveforms". Plasma Sources Science and Technology 22 6 (2013): 065013-065013. https://doi.org/10.1088%2F0963-0252%2F22%2F6%2F065013.
    10.1088/0963-0252/22/6/065013
  19. Marinov, D.. "Direct observation of ozone formation on SiO2 surfaces in O 2 discharges". Journal of Physics D: Applied Physics 46 3 (2013): http://www.scopus.com/inward/record.url?eid=2-s2.0-84871196114&partnerID=MN8TOARS.
    10.1088/0022-3727/46/3/032001
  20. Lafleur, T.. "Secondary electron induced asymmetry in capacitively coupled plasmas". Journal of Physics D: Applied Physics 46 13 (2013): http://www.scopus.com/inward/record.url?eid=2-s2.0-84874888135&partnerID=MN8TOARS.
    10.1088/0022-3727/46/13/135201
  21. Lafleur, T.. "Radio frequency current-voltage probe for impedance and power measurements in multi-frequency unmatched loads". Review of Scientific Instruments 84 1 (2013): http://www.scopus.com/inward/record.url?eid=2-s2.0-84874101642&partnerID=MN8TOARS.
    10.1063/1.4773540
  22. Lisovskiy, V.. "Normal regime of the weak-current mode of an rf capacitive discharge". Plasma Sources Science and Technology 22 1 (2013): http://www.scopus.com/inward/record.url?eid=2-s2.0-84874065524&partnerID=MN8TOARS.
    10.1088/0963-0252/22/1/015018
  23. Wang, Y.. "Fine-structure-resolved electron collisions from chlorine atoms in the (3p5)2P3/2o and (3p5)2P1/2o states". Physical Review A - Atomic, Molecular, and Optical Physics 87 2 (2013): http://www.scopus.com/inward/record.url?eid=2-s2.0-84873418599&partnerID=MN8TOARS.
    10.1103/PhysRevA.87.022703
  24. Booth, J.P.. "Absolute atomic chlorine densities in a Cl 2 inductively coupled plasma determined by two-photon laser-induced fluorescence with a new calibration method". Journal of Physics D: Applied Physics 45 19 (2012): http://www.scopus.com/inward/record.url?eid=2-s2.0-84860327220&partnerID=MN8TOARS.
    10.1088/0022-3727/45/19/195201
  25. Šamara, V.. "A dc-pulsed capacitively coupled planar Langmuir probe for plasma process diagnostics and monitoring". Plasma Sources Science and Technology 21 6 (2012): http://www.scopus.com/inward/record.url?eid=2-s2.0-84870346300&partnerID=MN8TOARS.
    10.1088/0963-0252/21/6/065004
  26. Johnson, E.V.. "Hydrogenated microcrystalline silicon thin films deposited by RF-PECVD under low ion bombardment energy using voltage waveform tailoring". Journal of Non-Crystalline Solids 358 17 (2012): 1974-1977. http://www.scopus.com/inward/record.url?eid=2-s2.0-84865789780&partnerID=MN8TOARS.
    10.1016/j.jnoncrysol.2012.01.014
  27. Lisovskiy, V.. "Gas molecule dissociation effect on rf discharge burning in low pressure ammonia". Physics Letters, Section A: General, Atomic and Solid State Physics 376 33 (2012): 2238-2243. http://www.scopus.com/inward/record.url?eid=2-s2.0-84861823492&partnerID=MN8TOARS.
    10.1016/j.physleta.2012.05.040
  28. Lafleur, T.. "Enhanced sheath heating in capacitively coupled discharges due to non-sinusoidal voltage waveforms". Applied Physics Letters 100 19 (2012): http://www.scopus.com/inward/record.url?eid=2-s2.0-84862095724&partnerID=MN8TOARS.
    10.1063/1.4712128
  29. Lafleur, T.. "Control of the ion flux and ion energy in CCP discharges using non-sinusoidal voltage waveforms". Journal of Physics D: Applied Physics 45 39 (2012): http://www.scopus.com/inward/record.url?eid=2-s2.0-84866359036&partnerID=MN8TOARS.
    10.1088/0022-3727/45/39/395203
  30. Johnson, E.V.. "Tailored voltage waveform deposition of microcrystalline silicon thin films from hydrogen-diluted silane and silicon tetrafluoride: Optoelectronic properties of films". Japanese Journal of Applied Physics 51 8 PART 2 (2012): http://www.scopus.com/inward/record.url?eid=2-s2.0-84865260180&partnerID=MN8TOARS.
    10.1143/JJAP.51.08HF01
  31. Lafleur, T.. "Separate control of the ion flux and ion energy in capacitively coupled radio-frequency discharges using voltage waveform tailoring". Applied Physics Letters 101 12 (2012): http://www.scopus.com/inward/record.url?eid=2-s2.0-84866842512&partnerID=MN8TOARS.
    10.1063/1.4754692
  32. Johnson, E.V.. "Microcrystalline silicon solar cells deposited using a plasma process excited by tailored voltage waveforms". Applied Physics Letters 100 13 (2012): http://www.scopus.com/inward/record.url?eid=2-s2.0-84859539342&partnerID=MN8TOARS.
    10.1063/1.3699222
  33. Johnson, E.V.. "Control of nanocrystalline silicon growth phase and deposition rate through voltage waveform tailoring during PECVD". Materials Research Society Symposium Proceedings 1339 (2011): 32-37. http://www.scopus.com/inward/record.url?eid=2-s2.0-84860172189&partnerID=MN8TOARS.
    10.1557/opl.2011.993
  34. Lisovskiy, V.. "Electron drift velocity in SF6 in strong electric fields determined from rf breakdown curves". Journal of Physics D: Applied Physics 43 38 (2010): http://www.scopus.com/inward/record.url?eid=2-s2.0-78249237536&partnerID=MN8TOARS.
    10.1088/0022-3727/43/38/385203
  35. Booth, J.P.. "Dual-frequency capacitive radiofrequency discharges: Effect of low-frequency power on electron density and ion flux". Plasma Sources Science and Technology 19 1 (2010): http://www.scopus.com/inward/record.url?eid=2-s2.0-70450208772&partnerID=MN8TOARS.
    10.1088/0963-0252/19/1/015005
  36. Curley, G.A.. "Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements". Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 28 2 (2010): 360-372. http://www.scopus.com/inward/record.url?eid=2-s2.0-77949358042&partnerID=MN8TOARS.
    10.1116/1.3330766
  37. Lisovskiy, V.. "Similarity law for rf breakdown". EPL 82 1 (2008): http://www.scopus.com/inward/record.url?eid=2-s2.0-79051471490&partnerID=MN8TOARS.
    10.1209/0295-5075/82/15001
  38. Lisovskiy, V.. "Modes of low-pressure dual-frequency (27/2 MHz) discharges in hydrogen". Plasma Sources Science and Technology 17 2 (2008): http://www.scopus.com/inward/record.url?eid=2-s2.0-43149117477&partnerID=MN8TOARS.
    10.1088/0963-0252/17/2/025002
  39. Lisovskiy, V.. "Electron drift velocity in silane in strong electric fields determined from rf breakdown curves". Journal of Physics D: Applied Physics 40 11 (2007): 3408-3410. http://www.scopus.com/inward/record.url?eid=2-s2.0-34249291954&partnerID=MN8TOARS.
    10.1088/0022-3727/40/11/022
  40. Lisovskiy, V.. "Applying RF current harmonics for end-point detection during etching multi-layered substrates and cleaning discharge chambers with NF3 discharge". Vacuum 82 3 (2007): 321-327. http://www.scopus.com/inward/record.url?eid=2-s2.0-35448983901&partnerID=MN8TOARS.
    10.1016/j.vacuum.2007.04.035
  41. Curley, G.A.. "Negative ions in single and dual frequency capacitively coupled fluorocarbon plasmas". Plasma Sources Science and Technology 16 1 (2007): http://www.scopus.com/inward/record.url?eid=2-s2.0-33947635106&partnerID=MN8TOARS.
    10.1088/0963-0252/16/1/S09
  42. Lisovskiy, V.. "Modes of rf capacitive discharge in low-pressure sulfur hexafluoride". Journal of Physics D: Applied Physics 40 22 (2007): 6989-6999. http://www.scopus.com/inward/record.url?eid=2-s2.0-36448950898&partnerID=MN8TOARS.
    10.1088/0022-3727/40/22/020
  43. Lisovskiy, V.. "Low-pressure gas breakdown in dual-frequency RF electric fields in nitrogen". EPL 80 2 (2007): http://www.scopus.com/inward/record.url?eid=2-s2.0-79051468945&partnerID=MN8TOARS.
    10.1209/0295-5075/80/25001
  44. McWilliams, R.. "Laser-induced fluorescence ion diagnostics in light of plasma processing". Thin Solid Films 515 12 (2007): 4860-4863. http://www.scopus.com/inward/record.url?eid=2-s2.0-33947176043&partnerID=MN8TOARS.
    10.1016/j.tsf.2006.10.027
  45. Lisovskiy, V.A.. "The effect of discharge chamber geometry on the characteristics of low-pressure RF capacitive discharges". IEEE Transactions on Plasma Science 35 2 III (2007): 416-424. http://www.scopus.com/inward/record.url?eid=2-s2.0-34247395857&partnerID=MN8TOARS.
    10.1109/TPS.2007.893261
  46. Lisovskiy, V.. "Rf discharge dissociative mode in NF3 and SiH4". Journal of Physics D: Applied Physics 40 21 (2007): 6631-6640. http://www.scopus.com/inward/record.url?eid=2-s2.0-35548992001&partnerID=MN8TOARS.
    10.1088/0022-3727/40/21/023
  47. Lisovskiy, V.. "Electron drift velocity in argon, nitrogen, hydrogen, oxygen and ammonia in strong electric fields determined from rf breakdown curves". Journal of Physics D: Applied Physics 39 4 (2006): 660-665. http://www.scopus.com/inward/record.url?eid=2-s2.0-32144459839&partnerID=MN8TOARS.
    10.1088/0022-3727/39/4/011
  48. Lisovskiy, V.. "Electron drift velocity in N2O in strong electric fields determined from rf breakdown curves". Journal of Physics D: Applied Physics 39 9 (2006): 1866-1871. http://www.scopus.com/inward/record.url?eid=2-s2.0-33646421426&partnerID=MN8TOARS.
    10.1088/0022-3727/39/9/022
  49. Lisovskiy, V.. "A technique for evaluating the RF voltage across the electrodes of a capacitively-coupled plasma reactor". EPJ Applied Physics 36 2 (2006): 177-182. http://www.scopus.com/inward/record.url?eid=2-s2.0-33751207726&partnerID=MN8TOARS.
    10.1051/epjap:2006116
  50. Lisovskiy, V.. "Modes and the alpha-gamma transition in rf capacitive discharges in N 2O at different rf frequencies". Physics of Plasmas 13 10 (2006): http://www.scopus.com/inward/record.url?eid=2-s2.0-33750498704&partnerID=MN8TOARS.
    10.1063/1.2364135
  51. Booth, J.P.. "CF and CF2 radical kinetics and transport in a pulsed CF 4 ICP". Plasma Sources Science and Technology 14 2 (2005): 273-282. http://www.scopus.com/inward/record.url?eid=2-s2.0-18744407035&partnerID=MN8TOARS.
    10.1088/0963-0252/14/2/008
  52. Jolly, J.. "Atomic hydrogen densities in capacitively coupled very high-frequency plasmas in H 2: Effect of excitation frequency". Journal of Applied Physics 97 10 (2005): http://www.scopus.com/inward/record.url?eid=2-s2.0-21044449459&partnerID=MN8TOARS.
    10.1063/1.1900290
  53. Dine, S.. "A novel technique for plasma density measurement using surface-wave transmission spectra". Plasma Sources Science and Technology 14 4 (2005): 777-786. http://www.scopus.com/inward/record.url?eid=2-s2.0-27744585130&partnerID=MN8TOARS.
    10.1088/0963-0252/14/4/017
  54. Lisovskiy, V.. "The effect of discharge chamber geometry on the ignition of low-pressure rf capacitive discharges". Physics of Plasmas 12 9 (2005): 1-8. http://www.scopus.com/inward/record.url?eid=2-s2.0-27344440958&partnerID=MN8TOARS.
    10.1063/1.2033748
  55. Perret, A.. "Ion energy uniformity in high-frequency capacitive discharges". Applied Physics Letters 86 2 (2005): http://www.scopus.com/inward/record.url?eid=2-s2.0-19744382874&partnerID=MN8TOARS.
    10.1063/1.1848183
  56. Lisovskiy, V.. "Extinction of RF capacitive low-pressure discharges". Europhysics Letters 71 3 (2005): 407-411. http://www.scopus.com/inward/record.url?eid=2-s2.0-23444455995&partnerID=MN8TOARS.
    10.1209/epl/i2005-10108-1
  57. Lisovskiy, V.. "Electron drift velocity in NH 3 in strong electric fields determined from rf breakdown curves". Journal of Physics D: Applied Physics 38 6 (2005): 872-876. http://www.scopus.com/inward/record.url?eid=2-s2.0-15744364675&partnerID=MN8TOARS.
    10.1088/0022-3727/38/6/015
  58. Bulcourt, N.. "Use of the ultraviolet absorption spectrum of CF 2 to determine the spatially resolved absolute CF 2 density, rotational temperature, and vibrational distribution in a plasma etching reactor". Journal of Chemical Physics 120 20 (2004): 9499-9508. http://www.scopus.com/inward/record.url?eid=2-s2.0-2942529083&partnerID=MN8TOARS.
    10.1063/1.1695313
  59. Chabert, P.. "Radical dynamics in unstable CF4 inductive discharges". Journal of Applied Physics 94 1 (2003): 76-84. http://www.scopus.com/inward/record.url?eid=2-s2.0-0042843303&partnerID=MN8TOARS.
    10.1063/1.1578175
  60. Perret, A.. "Ion flux nonuniformities in large-area high-frequency capacitive discharges". Applied Physics Letters 83 2 (2003): 243-245. http://www.scopus.com/inward/record.url?eid=2-s2.0-0042769375&partnerID=MN8TOARS.
    10.1063/1.1592617
  61. Luque, J.. "CF A2s+-X2¿ and B2 ¿ - X2¿ study by broadband absorption spectroscopy in a plasma etch reactor: Determination of transition probabilities, CF X2¿ concentrations, and gas temperatures". Journal of Chemical Physics 118 2 (2003): 622-632. http://www.scopus.com/inward/record.url?eid=2-s2.0-0037425696&partnerID=MN8TOARS.
    10.1063/1.1527923
  62. Luque, J.. "Broadband absorption and ab initio results on the CF C2S+-X2¿ system". Journal of Chemical Physics 118 3 (2003): 1206-1213. http://www.scopus.com/inward/record.url?eid=2-s2.0-0037439699&partnerID=MN8TOARS.
    10.1063/1.1526637
  63. Lieberman, M.A.. "Standing wave and skin effects in large-area, high-frequency capacitive discharges". Plasma Sources Science and Technology 11 3 (2002): 283-293. http://www.scopus.com/inward/record.url?eid=2-s2.0-0036672649&partnerID=MN8TOARS.
    10.1088/0963-0252/11/3/310
  64. Lieberman, M.A.. "Standing wave and skin effects in large area, high frequency capacitive discharges". IEEE International Conference on Plasma Science (2002): http://www.scopus.com/inward/record.url?eid=2-s2.0-0036373524&partnerID=MN8TOARS.
  65. Booth, J.-P.. "Diagnostics of etching plasmas". Pure and Applied Chemistry 74 3 (2002): 397-400. http://www.scopus.com/inward/record.url?eid=2-s2.0-0036296946&partnerID=MN8TOARS.
  66. Chabert, P.. "Reactive ion etching of silicon carbide in SF6 gas: Detection of CF, CF2, and SiF2 etch products". Applied Physics Letters 79 7 (2001): 916-918. http://www.scopus.com/inward/record.url?eid=2-s2.0-0040623256&partnerID=MN8TOARS.
    10.1063/1.1395520
  67. Cunge, G.. "Absolute fluorine atom concentrations in fluorocarbon plasmas determined from CF2 loss kinetics". Journal of Applied Physics 89 12 (2001): 7750-7755. http://www.scopus.com/inward/record.url?eid=2-s2.0-0035875448&partnerID=MN8TOARS.
    10.1063/1.1371940
  68. Booth, J.P.. "Measurements of characteristic transients of planar electrostatic probes in cold plasmas". Review of Scientific Instruments 71 7 (2000): 2722-2727. http://www.scopus.com/inward/record.url?eid=2-s2.0-0000080651&partnerID=MN8TOARS.
  69. Booth, J.P.. "Ultraviolet cavity ring-down spectroscopy of free radicals in etching plasmas". Chemical Physics Letters 317 6 (2000): 631-636. http://www.scopus.com/inward/record.url?eid=2-s2.0-0001666727&partnerID=MN8TOARS.
  70. Cunge, G.. "CF2 production and loss mechanisms in fluorocarbon discharges: Fluorine-poor conditions and polymerization". Journal of Applied Physics 85 8 I (1999): 3952-3959. http://www.scopus.com/inward/record.url?eid=2-s2.0-0001620883&partnerID=MN8TOARS.
  71. Schwarzenbach, W.. "High mass positive ions and molecules in capacitively-coupled radio-frequency CF4 plasmas". Journal of Applied Physics 85 11 (1999): 7562-7568. http://www.scopus.com/inward/record.url?eid=2-s2.0-0000065977&partnerID=MN8TOARS.
  72. Booth, J.P.. "CFx radical production and loss in a CF4 reactive ion etching plasma: Fluorine rich conditions". Journal of Applied Physics 85 6 (1999): 3097-3107. http://www.scopus.com/inward/record.url?eid=2-s2.0-0000347228&partnerID=MN8TOARS.
  73. Tserepi, A.D.. "CF 2 kinetics and related mechanisms in the presence of polymers in fluorocarbon plasmas". Journal of Applied Physics 81 5 (1997): 2124-2130. http://www.scopus.com/inward/record.url?eid=2-s2.0-0000869826&partnerID=MN8TOARS.
  74. Booth, J.P.. "The transition from symmetric to asymmetric discharges in pulsed 13.56 MHz capacitively coupled plasmas". Journal of Applied Physics 82 2 (1997): 552-560. http://www.scopus.com/inward/record.url?eid=2-s2.0-0001738237&partnerID=MN8TOARS.
  75. Booth, J.P.. "Electric field measurements in discharges by Doppler-free two-photon laser Stark spectroscopy of atomic hydrogen". Optics Communications 132 3-4 (1996): 363-370. http://www.scopus.com/inward/record.url?eid=2-s2.0-0030379734&partnerID=MN8TOARS.
  76. Cunge, G.. "Absolute concentration measurements by pulsed laser-induced fluorescence in low-pressure gases: Allowing for saturation effects". Chemical Physics Letters 263 5 (1996): 645-650. http://www.scopus.com/inward/record.url?eid=2-s2.0-0030596221&partnerID=MN8TOARS.
    10.1016/S0009-2614(96)01259-6
  77. Braithwaite, N.St.J.. "A novel electrostatic probe method for ion flux measurements". Plasma Sources Science and Technology 5 4 (1996): 677-684. http://www.scopus.com/inward/record.url?eid=2-s2.0-0030282058&partnerID=MN8TOARS.
    10.1088/0963-0252/5/4/009
  78. Fadlallah, M.. "Sheath electric field oscillation and ion kinetics in radio-frequency discharges". Journal of Applied Physics 79 12 (1996): 8976-8981. http://www.scopus.com/inward/record.url?eid=2-s2.0-0042044260&partnerID=MN8TOARS.
  79. Booth, J.-P.. "Quantitative laser-induced fluorescence spectroscopy of the CF A2S+-X2¿ transition: Electronic transition dipole moment function and predissociation". Journal of Physical Chemistry 100 1 (1996): 47-53. http://www.scopus.com/inward/record.url?eid=2-s2.0-0002278512&partnerID=MN8TOARS.
  80. Gicquel, A.. "Ground state and excited state H-atom temperatures in a microwave plasma diamond deposition reactor". Journal de Physique III 6 9 (1996): 1167-1180. http://www.scopus.com/inward/record.url?eid=2-s2.0-0030247099&partnerID=MN8TOARS.
  81. Ellingboe, A.R.. "Electron beam pulses produced by helicon-wave excitation". Physics of Plasmas 2 6 (1995): 1807-1809. http://www.scopus.com/inward/record.url?eid=2-s2.0-0001760372&partnerID=MN8TOARS.
  82. St-Onge, L.. "On the formation and loss of S2 molecules in a reactive ion etching reactor operating with SF6". Journal of Applied Physics 78 12 (1995): 6957-6966. http://www.scopus.com/inward/record.url?eid=2-s2.0-0038254013&partnerID=MN8TOARS.
    10.1063/1.360463
  83. Chenevier, M.. "Measurement of atomic hydrogen in a hot filament reactor by two-photon laser-induced fluorescence". Diamond and Related Materials 3 4-6 (1994): 587-592. http://www.scopus.com/inward/record.url?eid=2-s2.0-0028413804&partnerID=MN8TOARS.
  84. Booth, J.P.. "Electric field measurements in discharges by 2+1 photon laser Stark spectroscopy of atomic hydrogen". Applied Physics Letters 65 7 (1994): 819-821. http://www.scopus.com/inward/record.url?eid=2-s2.0-0000812694&partnerID=MN8TOARS.
    10.1063/1.112241
  85. Booth, J.P.. "Oxygen atom actinometry reinvestigated: Comparison with absolute measurements by resonance absorption at 130 nm". Journal of Applied Physics 69 2 (1991): 618-626. http://www.scopus.com/inward/record.url?eid=2-s2.0-0000534308&partnerID=MN8TOARS.
    10.1063/1.347395
  86. Booth, J.P.. "Oxygen and fluorine atom kinetics in electron cyclotron resonance plasmas by time-resolved actinometry". Journal of Applied Physics 70 2 (1991): 611-620. http://www.scopus.com/inward/record.url?eid=2-s2.0-36449009705&partnerID=MN8TOARS.
    10.1063/1.349662
  87. Raynaud, P.. "Hydrogen plasma treatment: desorption of atomic hydrogen from silicon surfaces studied by in-situ spectroscopic ellipsometry". Physica B: Physics of Condensed Matter 170 1-4 (1991): 497-502. http://www.scopus.com/inward/record.url?eid=2-s2.0-0026138666&partnerID=MN8TOARS.
  88. Raynaud, P.. "Hydrogen plasma treatment of silicon surfaces studied by in-situ spectroscopic ellipsometry". Applied Surface Science 46 1-4 (1990): 435-440. http://www.scopus.com/inward/record.url?eid=2-s2.0-0025545375&partnerID=MN8TOARS.
  89. Booth, J.P.. "Spatially and temporally resolved laser-induced fluorescence measurements of CF2 and CF radicals in a CF4 rf plasma". Journal of Applied Physics 66 11 (1989): 5251-5257. http://www.scopus.com/inward/record.url?eid=2-s2.0-36549100100&partnerID=MN8TOARS.
    10.1063/1.343712
  90. Booth, J.P.. "The radiative lifetime of CF(A 2S+)". Chemical Physics Letters 150 5 (1988): 457-460. http://www.scopus.com/inward/record.url?eid=2-s2.0-0000692092&partnerID=MN8TOARS.
  91. Booth, J.P.. "Laser induced fluorescence detection of CF and CF2 radicals in a CF4/O2 plasma". Applied Physics Letters 50 6 (1987): 318-319. http://www.scopus.com/inward/record.url?eid=2-s2.0-0001093529&partnerID=MN8TOARS.
    10.1063/1.98214
  92. Booth, J.P.. "Alignment effects in the multiple photon ionisation of nitric oxide". Chemical Physics Letters 113 6 (1985): 509-514. http://www.scopus.com/inward/record.url?eid=2-s2.0-0343585599&partnerID=MN8TOARS.
Atividades

Arbitragem científica em revista

Nome da revista (ISSN) Editora
2016/06/01 - Atual Plasma Sources, Science and Technology (1361-6595) Institute of Physics
Distinções

Prémio

2019 AVS Plasma Science & Technology Division Prize
American Vacuum Society Inc, Estados Unidos
1984 Physical Chemistry Part II Thesis Prize, Oxford University
University of Oxford, Reino Unido
1980 Stapeldon Scholarship
University of Oxford Exeter College, Reino Unido

Título

2010 Fellow of the AVS
American Vacuum Society Inc, Estados Unidos