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Rodrigo Pessoa. Completed the Postgraduate Certificate in Mestrado em Ciências in 2005/05/01 by Instituto Tecnológico de Aeronáutica, Postgraduate Certificate in Doutorado em Ciências in 2009/08/10 by Instituto Tecnológico de Aeronáutica and Licence in Licence in Physics in 2002/12/10 by Universidade Estadual Paulista Júlio de Mesquita Filho. Is Assistant Professor in Instituto Tecnológico de Aeronáutica. Published 55 articles in journals. Has 1 section(s) of books and 13 book(s). Works in the area(s) of Exact Sciences with emphasis on Physical Sciences with emphasis on Fluids and Plasma Physics and Engineering and Technology with emphasis on Materials Engineering with emphasis on Coating and Films. In his curriculum Ciência Vitae the most frequent terms in the context of scientific, technological and artistic-cultural output are: Langmuir probe; Hollow cathode; Global model; Plasma simulation; Atmospheric plasmas; Low pressure plasmas; Plasma etching; PEALD; Thin films; Atomic layer deposition; Magnetron sputtering; Titanium dioxide; Silicon carbide; Aluminum nitride; .
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Identification

Personal identification

Full name
Rodrigo Pessoa

Citation names

  • Pessoa, Rodrigo

Author identifiers

Ciência ID
EB1E-4693-DEC7
ORCID iD
0000-0001-7600-9747
Google Scholar ID
https://scholar.google.com.br/citations?user=aH0xOJsAAAAJ&hl=en
Researcher Id
F-5731-2010

Telephones

Telephone
  • (+55) 39475785 (Professional)

Addresses

  • Praça Marechal Eduardo Gomes, 50, Vila das Acácias, 12228-900, São José dos Campos, São Paulo, Brazil (Professional)

Websites

Knowledge fields

  • Exact Sciences - Physical Sciences - Fluids and Plasma Physics
  • Engineering and Technology - Materials Engineering - Coating and Films

Languages

Language Speaking Reading Writing Listening Peer-review
Portuguese (Mother tongue)
English Upper intermediate (B2) Advanced (C1) Advanced (C1) Upper intermediate (B2) Advanced (C1)
Education
Degree Classification
2005/03/01 - 2009/08/10
Concluded
 Doutorado em Ciências (Postgraduate Certificate)
Major in Plasma Physics
Instituto Tecnológico de Aeronáutica, Brazil
2003/02/01 - 2005/05/01
Concluded
 Mestrado em Ciências (Postgraduate Certificate)
Major in Plasma Physics
Instituto Tecnológico de Aeronáutica, Brazil
1998/02/01 - 2002/12/10
Concluded
 Licence in Physics (Licence)
Universidade Estadual Paulista Júlio de Mesquita Filho, Brazil
Affiliation

Teaching in Higher Education

Category
Host institution 		Employer
2018/06/04 - Current Assistant Professor (University Teacher) Instituto Tecnológico de Aeronáutica, Brazil
2017/05/01 - 2018/06/04 Full Professor (University Teacher) Universidade Brasil, Brazil
2011/02/10 - 2017/05/30 Associate Professor (University Teacher) Universidade do Vale do Paraiba, Brazil
Projects

Grant

Designation Funders
2019/02 - 2022/02 Filmes de tio2 e zno crescidos por deposição por camada atômica assistida à plasma para aplicação como camada bloqueio em células solares perovskitas não tóxicas
N/A
 Conselho Nacional de Desenvolvimento Científico e Tecnológico
2018/05 - 2020/04 Síntese e análise microbiológica de substratos poliméricos recobertos com filmes ultra-finos de TiO2 e/ou Al2O3 pela tecnologia de deposição por camada atômica
2018/01265-1
 Fundação de Amparo à Pesquisa do Estado de São Paulo
2014/11 - 2017/11 Diagnóstico do processo de corrosão de filmes finos baseados em carbeto de silício
grant.CNPq_f4dfe54106
 Conselho Nacional de Desenvolvimento Científico e Tecnológico
Outputs

Publications

Book
  1. Fraga, M.A.; Contin, A.; Savonov, G.S.; Barbosa, D.C.; Pessoa, R.S.; Trava Airoldi, V.J.. Addressing the properties of ultranano- and microcrystalline CVD diamond films grown on 4H-SiC substrates. 2018.
    10.4028/www.scientific.net/MSF.924.927
  2. Fraga, M.A.; Rodríguez, L.A.A.; Pessoa, R.S.; Trava-Airoldi, V.J.. Understanding the role of CVD nanodiamond thin films in solar energy conversion. 2017.
  3. Doria, A.C.O.C.; Figueira, F.R.; Lima, J.S.B.; Maciel, H.S.; Khouri, S.; Pessoa, R.S.. Sterilization of candida albicans biofilms grown on polymers by atmospheric plasma: From plasma devices to biofilm analysis. 2016.
  4. Pessoa, R.S.; Fraga, M.A.; Santos, L.V.; Galvão, N.K.A.M.; Maciel, H.S.; Massi, M.. Plasma-assisted techniques for growing hard nanostructured coatings: An overview. 2014.
    10.1016/B978-0-85709-211-3.00018-2
  5. Fraga, M.A.; Pessoa, R.S.. Thin-film resistors: Review and perspectives. 2013.
  6. Pessoa, R.S.; Sismanoglu, B.N.; Gomes, M.P.; Medeiros, H.S.; Sagás, J.C.; Roberto, M.; Maciel, H.S.; Petraconi, G.. Chemistry studies of low-pressure argon discharges: Experiments and simulation. 2013.
  7. Sismanoglu, B.N.; Maciel, H.S.; Pessoa, R.S.; Radmilovic-Radjenovic, M.. Preface. 2013.
  8. Petraconi, G.; Guimarães Neto, A.B.; Maciel, H.S.; Sismanoglu, B.N.; Pessoa, R.S.. Experimental and theoretical studies of the cathode sheath of an argon low pressure hollow cathode discharge. 2013.
  9. Sismanoglu, B.N.; Maciel, H.S.; Radmilovic-Radjenovic, M.; Pessoa, R.S.. Argon: Production, characteristics and applications. 2013.
  10. Sismanoglu, B.N.; Pessoa, R.S.; Caetano, R.; Hoyer, Y.D.; Maciel, H.S.; Grigorov, K.G.. Argon properties, production and recent applications. 2013.
  11. Medeiros, H.S.; Pessoa, R.S.; Sagás, J.C.; Fraga, M.A.; Santos, L.V.; Maciel, H.S.; Massi, M.; Da Silva Sobrinho, A.S.. Si xC y thin films deposited at low temperature by DC dual magnetron sputtering: Effect of power supplied to Si and C cathode targets on film physicochemical properties. 2012.
    10.4028/www.scientific.net/MSF.717-720.197
  12. Marciano, F.R.; Bonetti, L.F.; Pessoa, R.S.; Marcuzzo, J.S.; Massi, M.; Santos, L.V.; Corat, E.J.; Trava-Airoldi, V.J.. Mass spectrometry evaluation of the improvement of DLC film lifetime using silver nanoparticles for application on space devices: Material review and etching experiments. 2011.
  13. Marciano, F.R.; Bonetti, L.F.; Pessoa, R.S.; Marcuzzo, J.S.; Massi M.; Santos, L.V.; Corat, E.J.; Trava-Airoldi, V.J.. Mass spectrometry evaluation of the improvement of DLC film lifetime using silver nanoparticles for application on space devices: Material review and etching experiments. 2010.
Book chapter
  1. Pessoa, R.S.; Fraga, M.A.. "Biomedical applications of ultrathin atomic layer deposited metal oxide films on polymeric materials". 291-307. 2019.
    10.1016/B978-0-08-102572-7.00011-8
Conference paper
  1. Pessoa, R.S.; Junior, W.C.; Testoni, G.E.; Filho, G.P.; MacIel, H.S.. "On the influence of conductor, semiconductor and insulating substrate on the structure of atomic layer deposited titanium dioxide thin films". 2018.
    10.1109/SBMicro.2018.8511504
  2. Cirino, G.A.; Castro, R.M.; Pisani, M.B.; Verdonck, P.; Mansano, R.D.; Massi, M.; Pessoa, R.S.; et al. "Investigations of capacitively-coupled plasmas by electrostatic probe technique". 2015.
    10.1109/SBMicro.2015.7298131
  3. Toneli, D.A.; Roberto, M.; Pessoa, R.S.. "Study of non-maxwellian electron energy distribution functions for an oxygen discharge". 2015.
    10.1109/PLASMA.2014.7012703
  4. Toneli, D.A.; Pessoa, R.S.; Roberto, M.. "Study of non-Maxwellian electron energy distribution functions for an oxygen discharge". 2015.
    10.1109/PLASMA.2014.7012779
  5. Da Maia, J.V.; Pessoa, R.S.; Da Silva Sobrinho, A.S.; Massi, M.; MacIel, H.S.. "Optical characterization of glow and afterglow regions of Ar/O2 microwave Plasma: Effect of applied power and gas flow". 2014.
    10.1088/1742-6596/511/1/012016
  6. Toneli, D.A.; Pessoa, R.S.; Roberto, M.; Petraconi, G.; Maciel, H.S.. "Study of CF4 capacitive plasma chemistry through mass spectrometry technique and global model". 2013.
    10.1109/PPC.2013.6627595
  7. Pessoa, R.S.; Toneli, D.A.; Roberto, M.; Petraconi, G.; Maciel, H.S.. "Electron energy distribution function measurements in a low pressure expanding jet plasma". 2013.
    10.1109/PPC.2013.6627467
  8. Medeiros, H.S.; Pessoa, R.S.; Fraga, M.A.; Santos, L.V.; Maciel, H.S.; Massi, M.; Da Silva Sobrinho, A.S.. "Argon incorporation on silicon carbide thin films deposited by bias co-sputtering technique". 2012.
    10.1557/opl.2012.1147
  9. Fraga, M.A.; Furlan, H.; Pessoa, R.S.; Rasia, L.A.. "Structural and piezoresistive characteristics of amorphous silicon carbide films grown on AlN/Si substrates". 2012.
    10.1557/opl.2012.1148
  10. Petraconi, G.; Neto, A.B.G.; Maciel, H.S.; Pessoa, R.S.. "Studies of the cathode sheath of a low pressure hollow cathode discharge". 2012.
    10.1088/1742-6596/370/1/012041
  11. Wakawaiachi, S.M.; Tezani, L.L.; Pessoa, R.S.; Medeiros, H.S.; Maciel, H.S.; Petraconi, G.. "Morphological and chemical analysis of silicon etched by SF 6+O 2 and CF 4+O 2 low pressure constricted plasma jet". 2011.
    10.1149/1.3615220
  12. Fraga, M.A.; Furlan, H.; Pessoa, R.S.. "Comparison among performance of strain sensors based on different semiconductor thin films". 2011.
    10.1117/12.886624
  13. Pessoa, R.S.; Parada, S.W.C.; Fraga, M.A.; Roberto, M.; Maciel, H.S.; Petraconi, G.. "Studies about flow rate effect on atomic fluorine generation in inductively coupled CF4 plasmas: A global model investigation". 2010.
    10.1149/1.3474150
  14. Parada, S.; Pessoa, R.S.; Roberto, M.; Petraconi, G.. "Particle-in-cell simulation at low pressure oxygen discharges: Comparison with experimental data". 2010.
    10.1149/1.3474185
  15. Pessoa, R.S.; Tezani, L.; Wakavaiachi, S.M.; Maciel, H.S.; Petraconi, G.. "Optical diagnostics of SF6 low pressure plasma jet applied to silicon etching". 2009.
    10.1149/1.3183718
  16. Parada, S.W.C.; Pessoa, R.S.; Roberto, M.; Petraconi, G.. "Study of an asymmetric capacitive discharge in oxygen with global model and langmuir probe". 2009.
    10.1149/04901.0357ecst
  17. Medeiros, H.S.; Pessoa, R.S.; MacIel, H.S.; Massi, M.; Tezani, L.L.; Leal, G.; Galvão, N.K.A.M.; Da Silva Sobrinho, A.S.. "Amorphous silicon carbide thin films deposited by magnetron co-sputtering: Effect of applied power and deposition pressure on film characteristics". 2009.
    10.1149/04901.0375ecst
  18. Yamamoto, R.K.; Gongora-Rubio, M.R.; Pessoa, R.S.; Da Cunha, M.R.; Maciel, H.S.. "Mixed LTCC and LTTT technology for microplasma generator fabrication". 2008.
  19. Petraconi, G.; Gregori, M.L.; Costa, S.F.; Essiptchouk, E.M.; Otani, C.; Barros, E.A.; MacIel, H.S.; et al. "Ablation properties and behavior of carbon fiber reinforced carbon composite (C/C composite)". 2008.
  20. Fraga, M.A.; Pessoa, R.S.; Oliveira, I.C.; Massi, M.; Maciel, H.S.; Martinho, H.S.; Dos Santos Filho, S.G.; Marcuzzo, J.S.. "Etching characteristics and surface morphology of nitrogen-doped a-SiC films prepared by RF magnetron sputtering". 2008.
    10.1149/1.2956052
  21. Toku, H.; Pessoa, R.S.; Liberato, T.B.; Massi, M.; Maciel, H.S.; Da Silva Sobrinho, A.S.. "Effect of the substrate heating due to the sputtering process on the crystallinity of TiO2 thin films". 2007.
    10.1149/1.2766888
  22. Fraga, M.A.; Pessoa, R.S.; Massi, M.; Maciel, H.S.; Dos Santos Filho, S.G.. "Etching studies of post-annealed SiC films deposited by PECVD: Influence of the oxygen concentration". 2007.
    10.1149/1.2766893
Journal article
  1. Fernando Gasi; Gilberto Petraconi; Edison Bittencourt; Sérgio Ricardo Lourenço; Alonso Hernan Ricci Castro; Felipe de Souza Miranda; Alexei Mikhailovich Essiptchouk; et al. "Plasma Treatment of Polyamide Fabric Surface by Hybrid Corona-Dielectric Barrier Discharge: Material Characterization and Dyeing/Washing Processes". Materials Research 23 1 (2020): https://doi.org/10.1590%2F1980-5373-mr-2019-0255.
    10.1590/1980-5373-mr-2019-0255
  2. D A Toneli; R S Pessoa; M Roberto; J T Gudmundsson. "A global model study of low pressure high density CF4 discharge". Plasma Sources Science and Technology (2019): https://doi.org/10.1088/1361-6595/aaf412.
    10.1088/1361-6595/aaf412
  3. Dias, V.; Maciel, H.; Fraga, M.; Lobo, A.O.; Pessoa, R.; Marciano, F.R.. "Atomic layer deposited TiO 2 and Al 2 O 3 thin films as coatings for aluminum food packaging application". Materials 12 4 (2019): http://www.scopus.com/inward/record.url?eid=2-s2.0-85062213203&partnerID=MN8TOARS.
    10.3390/ma12040682
  4. Fraga, M.A.; Saddow, S.E.; Rodrigues, B.V.M.; De Moura Delezuk, J.A.; Pessoa, R.S.; Khapli, S.. "Introduction". Journal of Materials Research 34 11 (2019): 1828-1828. http://www.scopus.com/inward/record.url?eid=2-s2.0-85067363454&partnerID=MN8TOARS.
    10.1557/jmr.2019.174
  5. Galvão, N.; Guerino, M.; Campos, T.; Grigorov, K.; Fraga, M.; Rodrigues, B.; Pessoa, R.; et al. "The influence of AlN intermediate layer on the structural and chemical properties of SiC thin films produced by high-power impulse magnetron sputtering". Micromachines 10 3 (2019): http://www.scopus.com/inward/record.url?eid=2-s2.0-85063565545&partnerID=MN8TOARS.
    10.3390/mi10030202
  6. Tayna S. Cabral; Livia F. Sgobbi; Jorge Delezuk; Rodrigo S. Pessoa; Anderson O. Lobo; Bruno V.M. Rodrigues. "Glucose sensing via a green and low-cost platform from electrospun poly (vinyl alcohol)/graphene quantum dots fibers". Materials Today: Proceedings 14 (2019): 694-699. https://doi.org/10.1016%2Fj.matpr.2019.02.008.
    10.1016/j.matpr.2019.02.008
  7. Bruno V.M. Rodrigues; Vanessa M. Dias; Mariana A. Fraga; Argemiro S. da Silva Sobrinho; Anderson O. Lobo; Homero S. Maciel; Rodrigo S. Pessoa. "Atomic layer deposition of TiO2 thin films on electrospun poly (butylene adipate-co-terephthalate) fibers: Freestanding TiO2 nanostructures via polymer carbonization". Materials Today: Proceedings 14 (2019): 656-662. https://doi.org/10.1016%2Fj.matpr.2019.02.003.
    10.1016/j.matpr.2019.02.003
  8. A C O C Doria; F R Figueira; J S B de Lima; J A N Figueira; A H R Castro; B N Sismanoglu; G Petraconi; et al. "Inactivation of Candida albicans biofilms by atmospheric gliding arc plasma jet: effect of gas chemistry/flow and plasma pulsing". Plasma Research Express (2018): https://doi.org/10.1088/2516-1067/aae7e1.
    10.1088/2516-1067/aae7e1
  9. Pessoa, Rodrigo. "A Novel Method of Synthesizing Graphene for Electronic Device Applications". Materials (2018): http://www.mdpi.com/1996-1944/11/7/1120.
    10.3390/ma11071120
  10. Figueira, F.R.; Doria, A.C.O.C.; Khouri, S.; Maciel, H.S.; Pessoa, R.S.; Ramos, M.A.R.. "Effect of storage temperature on pH and conductivity of reverse osmosis water treated with atmospheric plasma". Plasma Medicine 8 3 (2018): 237-244. http://www.scopus.com/inward/record.url?eid=2-s2.0-85064761787&partnerID=MN8TOARS.
    10.1615/PLASMAMED.2018028327
  11. Pessoa, R.S.; Sagás, J.C.; Rodrigues, B.V.M.; Galvão, N.K.A.M.; Fraga, M.A.; Petraconi, G.; Maciel, H.S.. "Experimental studies on low-pressure plane-parallel hollow cathode discharges". Brazilian Journal of Physics 48 4 (2018): 411-420. http://www.scopus.com/inward/record.url?eid=2-s2.0-85064409411&partnerID=MN8TOARS.
    10.1007/s13538-018-0578-4
  12. Sagás, J.C.; Pessoa, R.S.; Maciel, H.S.. "Langmuir Probe Measurements in a Grid-Assisted Magnetron Sputtering System". Brazilian Journal of Physics 48 1 (2018): 61-66. http://www.scopus.com/inward/record.url?eid=2-s2.0-85040132868&partnerID=MN8TOARS.
    10.1007/s13538-017-0539-3
  13. Rodrigues, B.V.M.; Cabral, T.S.; Sgobbi, L.F.; Delezuk, J.A.M.; Pessoa, R.S.; Triboni, E.R.; de Moraes, T.B.F.; Lobo, A.O.. "A simple and green method for the production of nanostructured materials from poly(vinyl alcohol)/graphene quantum dots". Materials Chemistry and Physics 219 (2018): 242-250. http://www.scopus.com/inward/record.url?eid=2-s2.0-85053025895&partnerID=MN8TOARS.
    10.1016/j.matchemphys.2018.08.030
  14. Radi, P.A.; Testoni, G.E.; Pessoa, R.S.; Maciel, H.S.; Rocha, L.A.; Vieira, L.. "Tribocorrosion behavior of TiO2/Al2O3 nanolaminate, Al2O3, and TiO2 thin films produced by atomic layer deposition". Surface and Coatings Technology 349 (2018): 1077-1082. http://www.scopus.com/inward/record.url?eid=2-s2.0-85049473834&partnerID=MN8TOARS.
    10.1016/j.surfcoat.2018.06.036
  15. Simomura, L.S.; Doria, A.C.O.C.; Figueira, F.R.; Redi, G.T.C.; Lima, J.S.B.; Maciel, H.S.; Khouri, S.; Pessoa, R.S.. "Action of an argon/water vapor plasma jet in the sterilization of silicone contaminated with Candida albicans". Plasma Medicine 7 3 (2017): 299-311. http://www.scopus.com/inward/record.url?eid=2-s2.0-85041824309&partnerID=MN8TOARS.
    10.1615/PlasmaMed.2017019495
  16. Pessoa, R.S.; dos Santos, V.P.; Cardoso, S.B.; Doria, A.C.O.C.; Figueira, F.R.; Rodrigues, B.V.M.; Testoni, G.E.; et al. "TiO 2 coatings via atomic layer deposition on polyurethane and polydimethylsiloxane substrates: Properties and effects on C. albicans growth and inactivation process". Applied Surface Science 422 (2017): 73-84. http://www.scopus.com/inward/record.url?eid=2-s2.0-85020242484&partnerID=MN8TOARS.
    10.1016/j.apsusc.2017.05.254
  17. Santos, T.B.; Vieira, A.A.; Paula, L.O.; Santos, E.D.; Radi, P.A.; Khouri, S.; Maciel, H.S.; Pessoa, R.S.; Vieira, L.. "Flexible camphor diamond-like carbon coating on polyurethane to prevent Candida albicans biofilm growth". Journal of the Mechanical Behavior of Biomedical Materials 68 (2017): 239-246. http://www.scopus.com/inward/record.url?eid=2-s2.0-85013141225&partnerID=MN8TOARS.
    10.1016/j.jmbbm.2017.02.013
  18. Luqueta, G.R.; Dos Santos, E.D.; Pessoa, R.S.; Maciel, H.S.. "Evaluation of disposable medical device packaging materials under ozone sterilization". Revista Brasileira de Engenharia Biomedica 33 1 (2017): 58-68. http://www.scopus.com/inward/record.url?eid=2-s2.0-85019165682&partnerID=MN8TOARS.
    10.1590/2446-4740.03216
  19. Fraga, M.A.; Pessoa, R.S.; Barbosa, D.C.; Airoldi, V.J.T.. "One-dimensional carbon nanostructures - From synthesis to nano-electromechanical systems sensing applications-". Sensors and Materials 29 1 (2017): 39-56. http://www.scopus.com/inward/record.url?eid=2-s2.0-85012965491&partnerID=MN8TOARS.
    10.18494/SAM.2017.1366
  20. J. Libardi; K.G. Grigorov; M. Massi; A.S. da Silva Sobrinho; R.S. Pessoa; B. Sismanoglu. "Diffusion of silicon in titanium dioxide thin films with different degree of crystallinity: Efficiency of TiO2 and TiN barrier layers". Vacuum 128 (2016): 178-185. https://doi.org/10.1016/j.vacuum.2016.03.031.
    10.1016/j.vacuum.2016.03.031
  21. Chiappim, W.; Testoni, G.E.; de Lima, J.S.B.; Medeiros, H.S.; Pessoa, R.S.; Grigorov, K.G.; Vieira, L.; Maciel, H.S.. "Effect of Process Temperature and Reaction Cycle Number on Atomic Layer Deposition of TiO 2 Thin Films Using TiCl 4 and H 2 O Precursors: Correlation Between Material Properties and Process Environment". Brazilian Journal of Physics 46 1 (2016): 56-69. http://www.scopus.com/inward/record.url?eid=2-s2.0-84953449438&partnerID=MN8TOARS.
    10.1007/s13538-015-0383-2
  22. Luqueta, G.R.; Santos, E.D.; Pessoa, R.S.; MacIel, H.S.. "Wireless Sensor Network to Monitoring an Ozone Sterilizer". IEEE Latin America Transactions 14 5 (2016): 2167-2174. http://www.scopus.com/inward/record.url?eid=2-s2.0-84981294515&partnerID=MN8TOARS.
    10.1109/TLA.2016.7530410
  23. Gomes, M.P.; Nascimento, J.C.; Barbosa, I.M.; Martin, I.M.; Pessoa, R.S.; Carvalho, F.D.C.; Costa, L.M.D.S.; Sismanoglu, B.N.. "Electric field gradient in microplasmas". IEEE Latin America Transactions 14 2 (2016): 493-502. http://www.scopus.com/inward/record.url?eid=2-s2.0-84964329541&partnerID=MN8TOARS.
    10.1109/TLA.2016.7437184
  24. dos Santos, E.D.; Luqueta, G.; Rajasekaran, R.; dos Santos, T.B.; Doria, A.C.O.C.; Radi, P.A.; Pessoa, R.S.; Vieira, L.; Maciel, H.S.. "Macrophages adhesion rate on Ti-6Al-4V substrates: Polishing and DLC coating effects". Revista Brasileira de Engenharia Biomedica 32 2 (2016): 144-152. http://www.scopus.com/inward/record.url?eid=2-s2.0-84982292314&partnerID=MN8TOARS.
    10.1590/2446-4740.03616
  25. Testoni, G.E.; Chiappim, W.; Pessoa, R.S.; Fraga, M.A.; Miyakawa, W.; Sakane, K.K.; Galvão, N.K.A.M.; Vieira, L.; Maciel, H.S.. "Influence of the Al 2 O 3 partial-monolayer number on the crystallization mechanism of TiO 2 in ALD TiO 2 /Al 2 O 3 nanolaminates and its impact on the material properties". Journal of Physics D: Applied Physics 49 37 (2016): http://www.scopus.com/inward/record.url?eid=2-s2.0-84989170509&partnerID=MN8TOARS.
    10.1088/0022-3727/49/37/375301
  26. Chiappim, W.; Testoni, G.E.; Moraes, R.S.; Pessoa, R.S.; Sagás, J.C.; Origo, F.D.; Vieira, L.; MacIel, H.S.. "Structural, morphological, and optical properties of TiO 2 thin films grown by atomic layer deposition on fluorine doped tin oxide conductive glass". Vacuum 123 (2016): 91-102. http://www.scopus.com/inward/record.url?eid=2-s2.0-84964723096&partnerID=MN8TOARS.
    10.1016/j.vacuum.2015.10.019
  27. Chiappim, W.; Testoni, G.E.; Doria, A.C.O.C.; Pessoa, R.S.; Fraga, M.A.; Galvão, N.K.A.M.; Grigorov, K.G.; Vieira, L.; Maciel, H.S.. "Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: The influence of O2 plasma power, precursor chemistry and plasma exposure mode". Nanotechnology 27 30 (2016): http://www.scopus.com/inward/record.url?eid=2-s2.0-84978420946&partnerID=MN8TOARS.
    10.1088/0957-4484/27/30/305701
  28. De Almeida Maribondo Galvão, N.K.; De Vasconcelos, G.; Dos Santos, M.V.R.; Campos, T.M.B.; Pessoa, R.S.; Guerino, M.; Djouadi, M.A.; Maciel, H.S.. "Growth and characterization of graphene on polycrystalline SiC substrate using heating by CO2 laser beam". Materials Research 19 6 (2016): 1329-1334. http://www.scopus.com/inward/record.url?eid=2-s2.0-85007125149&partnerID=MN8TOARS.
    10.1590/1980-5373-MR-2016-0296
  29. Pessoa, R.S.; Fraga, M.A.; Santos, L.V.; Massi, M.; Maciel, H.S.. "Nanostructured thin films based on TiO2and/or SiC for use in photoelectrochemical cells: A review of the material characteristics, synthesis and recent applications". Materials Science in Semiconductor Processing 29 (2015): 56-68. http://www.scopus.com/inward/record.url?eid=2-s2.0-84915775588&partnerID=MN8TOARS.
    10.1016/j.mssp.2014.05.053
  30. Doria, A.C.O.C.; Sorge, C.P.C.; Santos, T.B.; Brandão, J.; Gonçalves, P.A.R.; Maciel, H.S.; Khouri, S.; Pessoa, R.S.. "Application of post-discharge region of atmospheric pressure argon and air plasma jet in the contamination control of candida albicans biofilms". Revista Brasileira de Engenharia Biomedica 31 4 (2015): 358-362. http://www.scopus.com/inward/record.url?eid=2-s2.0-84955303746&partnerID=MN8TOARS.
    10.1590/2446-4740.01215
  31. Toneli, D.A.; Pessoa, R.S.; Roberto, M.; Gudmundsson, J.T.. "A volume averaged global model study of the influence of the electron energy distribution and the wall material on an oxygen discharge". Journal of Physics D: Applied Physics 48 49 (2015): http://www.scopus.com/inward/record.url?eid=2-s2.0-84948167655&partnerID=MN8TOARS.
    10.1088/0022-3727/48/49/495203
  32. Pessoa, R.S.; Pereira, F.P.; Testoni, G.E.; Chiappim, W.; Maciel, H.S.; Santos, L.V.. "Effect of substrate type on structure of TiO<inf>2</inf>thin film deposited by atomic layer deposition technique". Journal of Integrated Circuits and Systems 10 1 (2015): 38-42. http://www.scopus.com/inward/record.url?eid=2-s2.0-84941105352&partnerID=MN8TOARS.
  33. Toneli, D.A.; Pessoa, R.S.; Roberto, M.; Gudmundsson, J.T.. "On the formation and annihilation of the singlet molecular metastables in an oxygen discharge". Journal of Physics D: Applied Physics 48 32 (2015): http://www.scopus.com/inward/record.url?eid=2-s2.0-84938802019&partnerID=MN8TOARS.
    10.1088/0022-3727/48/32/325202
  34. Vieira, L.; Lucas, F.L.C.; Fisssmer, S.F.; dos Santos, L.C.D.; Massi, M.; Leite, P.M.S.C.M.; Costa, C.A.R.; et al. "Scratch testing for micro- and nanoscale evaluation of tribocharging in DLC films containing silver nanoparticles using AFM and KPFM techniques". Surface and Coatings Technology 260 (2014): 205-213. http://www.scopus.com/inward/record.url?eid=2-s2.0-84918778414&partnerID=MN8TOARS.
    10.1016/j.surfcoat.2014.06.065
  35. Fraga, M.A.; Furlan, H.; Pessoa, R.S.; Massi, M.. "Wide bandgap semiconductor thin films for piezoelectric and piezoresistive MEMS sensors applied at high temperatures: An overview". Microsystem Technologies 20 1 (2014): 9-21. http://www.scopus.com/inward/record.url?eid=2-s2.0-84892579135&partnerID=MN8TOARS.
    10.1007/s00542-013-2029-z
  36. Tezani, L.L.; Pessoa, R.S.; Maciel, H.S.; Petraconi, G.. "Chemistry studies of SF6/CF4, SF6/O 2 and CF4/O2 gas phase during hollow cathode reactive ion etching plasma". Vacuum 106 (2014): 64-68. http://www.scopus.com/inward/record.url?eid=2-s2.0-84897542065&partnerID=MN8TOARS.
    10.1016/j.vacuum.2014.03.003
  37. Campos, T.M.B.; Da Silva Sobrinho, A.S.; Pessoa, R.S.; Maciel, H.S.; Massi, M.. "Characterization of SiC thin films deposited by HiPIMS Gabriela Leal1". Materials Research 17 2 (2014): 472-476. http://www.scopus.com/inward/record.url?eid=2-s2.0-84900437519&partnerID=MN8TOARS.
    10.1590/S1516-14392014005000038
  38. Fraga, M.A.; Pessoa, R.S.; Massi, M.; Maciel, H.S.. "Silicon carbide as base material for mems sensors of aerospace use: An overview,Carbeto de silício como material base para sensores mems de uso aeroespacial: Uma visão geral". Revista Materia 19 3 (2014): 274-290. http://www.scopus.com/inward/record.url?eid=2-s2.0-84907973452&partnerID=MN8TOARS.
    10.1590/S1517-70762014000300011
  39. Tezani, L.L.; Pessoa, R.S.; Moraes, R.S.; Medeiros, H.S.; Martins, C.A.; Maciel, H.S.; Petraconi Filho, G.; Massi, M.; da Silva Sobrinho, A.S.. "Automation of a Mass Flow Controller for Application in Time-Multiplex SF 6+CH 4 Plasma Etching of Silicon". Contributions to Plasma Physics 52 9 (2012): 735-743. http://www.scopus.com/inward/record.url?eid=2-s2.0-84867390590&partnerID=MN8TOARS.
    10.1002/ctpp.201200067
  40. Fraga, M. A.; Furlan, H.; Pessoa, R. S.; Rasia, L. A.; Mateus, C. F. R.. "Studies on SiC, DLC and TiO2 thin films as piezoresistive sensor materials for high temperature application". Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems 18 7-8 (2012): 1027-1033.
    10.1007/s00542-012-1435-y
  41. Yamamoto, R.K.; Pessoa, R.S.; Massi, M.; Grigorov, K.G.; Gongora-Rubio, M.R.; Maciel, H.S.. "Surface modification of polyethylene by medium pressure microplasma generator". Surface Engineering 27 2 (2011): 80-85. http://www.scopus.com/inward/record.url?eid=2-s2.0-79951684332&partnerID=MN8TOARS.
    10.1179/026708410X12459349719891
  42. Medeiros, H. S.; Pessoa, R. S.; Sagas, J. C.; Fraga, M. A.; Santos, L. V.; Maciel, H. S.; Massi, M.; Sobrinho, A. S. da Silva; da Costa, M. E. H. Maia. "Effect of nitrogen content in amorphous SiCxNyOz thin films deposited by low temperature reactive magnetron co-sputtering technique". Surface & Coatings Technology 206 7 (2011): 1787-1795.
    10.1016/j.surfcoat.2011.09.062
  43. Pessoa, R.S.; Tezani, L.L.; MacIel, H.S.; Petraconi, G.; Massi, M.. "Study of SF6 and SF6/O2 plasmas in a hollow cathode reactive ion etching reactor using Langmuir probe and optical emission spectroscopy techniques". Plasma Sources Science and Technology 19 2 (2010): http://www.scopus.com/inward/record.url?eid=2-s2.0-77950267258&partnerID=MN8TOARS.
    10.1088/0963-0252/19/2/025013
  44. Fraga, M.A.; Pessoa, R.S.; Maciel, H.S.; Massi, M.; de Castro Oliveira, I.. "Technology roadmap for development of SiC sensors at plasma processes laboratory". Journal of Aerospace Technology and Management 2 2 (2010): 219-224. http://www.scopus.com/inward/record.url?eid=2-s2.0-79952086569&partnerID=MN8TOARS.
    10.5028/jatm.2010.02027210
  45. Toku, H.; Pessoa, R.S.; Maciel, H.S.; Massi, M.; Mengui, U.A.. "Influence of process parameters on the growth of pure-phase anatase and rutile TiO2 thin films deposited by low temperature reactive magnetron sputtering". Brazilian Journal of Physics 40 3 (2010): 340-343. http://www.scopus.com/inward/record.url?eid=2-s2.0-77957950298&partnerID=MN8TOARS.
    10.1590/S0103-97332010000300015
  46. Petraconi, G.; Essiptchouk, A.M.; Charakhovski, L.I.; Otani, C.; Maciel, H.S.; Pessoa, R.S.; Gregori, M.L.; Costa, S.F.. "Degradation of carbon-based materials under ablative conditions produced by a high enthalpy plasma jet". Journal of Aerospace Technology and Management 2 1 (2010): 33-40. http://www.scopus.com/inward/record.url?eid=2-s2.0-79952045054&partnerID=MN8TOARS.
    10.5028/jatm.2010.02013340
  47. Yamamoto, R.K.; Gongora-Rubio, M.R.; Pessoa, R.S.; Cunha, M.R.; Maciel, H.S.. "Mixed LTCC and LTTT technology for microplasma generator fabrication". Journal of Microelectronics and Electronic Packaging 6 2 (2009): 101-107. http://www.scopus.com/inward/record.url?eid=2-s2.0-77952955389&partnerID=MN8TOARS.
    10.4071/1551-4897-6.2.101
  48. Marciano, F.R.; Bonetti, L.F.; Pessoa, R.S.; Massi, M.; Santos, L.V.; Trava-Airoldi, V.J.. "Oxygen plasma etching of silver-incorporated diamond-like carbon films". Thin Solid Films 517 19 (2009): 5739-5742. http://www.scopus.com/inward/record.url?eid=2-s2.0-66149191155&partnerID=MN8TOARS.
    10.1016/j.tsf.2009.04.037
  49. Marciano, FR; Bonetti, LF; Pessoa, RS; Marcuzzo, JS; Massi, M; Santos, LV; Trava-Airoldi, V. "The improvement of DLC film lifetime using silver nanoparticles for use on space devices". Diamond and Related Materials 17 7-10 (2008): 1674-1679.
    10.1016/j.diamond.2008.03.007
  50. Toku, H; Pessoa, RS; Maciel, HS; Massi, A; Mengui, UA. "The effect of oxygen concentration on the low temperature deposition of TiO2 thin films". Surface & Coatings Technology 202 10 (2008): 2126-2131.
    10.1016/j.surfcoat.2007.08.075
  51. Pessoa, R.S.; Maciel, H.S.; Petraconi, G.; Massi, M.; da Silva Sobrinho, A.S.. "Effect of gas residence time on the morphology of silicon surface etched in SF 6 plasmas". Applied Surface Science 255 3 (2008): 749-751. http://www.scopus.com/inward/record.url?eid=2-s2.0-55649109406&partnerID=MN8TOARS.
    10.1016/j.apsusc.2008.07.057
  52. Pessoa, R.S.; Murakami, G.; Massi, M.; Maciel, H.S.; Grigorov, K.; da Silva Sobrinho, A.S.; Petraconi, G.; Marcuzzo, J.S.. "Off-axis growth of AlN thin films by hollow cathode magnetron sputtering under various nitrogen concentrations". Diamond and Related Materials 16 4-7 SPEC. (2007): 1433-1436. http://www.scopus.com/inward/record.url?eid=2-s2.0-34047271127&partnerID=MN8TOARS.
    10.1016/j.diamond.2006.11.030
  53. Grigorov, K.; Massi, M.; Maciel, H.S.; Freitas, F.M.; Toku, H.; Pessoa, R.S.. "Etching of DLC films exposed to a plasma jet". Journal of Optoelectronics and Advanced Materials 9 2 (2007): 382-385. http://www.scopus.com/inward/record.url?eid=2-s2.0-38749138909&partnerID=MN8TOARS.
  54. Pessoa, R.S.; Murakami, G.; Petraconi, G.; Maciel, H.S.; Oliveira, I.C.; Grigorov, K.G.. "Hollow cathode magnetron deposition of AlN thin films: Crystalline structure and morphology". Brazilian Journal of Physics 36 2 A (2006): 332-335. http://www.scopus.com/inward/record.url?eid=2-s2.0-33746064113&partnerID=MN8TOARS.
    10.1590/S0103-97332006000300026
  55. Petraconi, G.; Maciel, H.S.; Pessoa, R.S.; Murakami, G.; Massi, M.; Otani, C.; Uruchi, W.M.I.; Sismanoglu, B.N.. "Longitudinal magnetic field effect on the electrical breakdown in low pressure gases". Brazilian Journal of Physics 34 4 B (2004): 1662-1666. http://www.scopus.com/inward/record.url?eid=2-s2.0-12744269966&partnerID=MN8TOARS.
    10.1590/S0103-97332004000800028

Other

Other output
  1. Biomedical applications of ultrathin atomic layer deposited metal oxide films on polymeric materials. 2019. Rodrigo Sávio Pessoa; Mariana Amorim Fraga. https://doi.org/10.1016%2Fb978-0-08-102572-7.00011-8.
    10.1016/b978-0-08-102572-7.00011-8
  2. A Novel Method of Synthesizing Graphene for Electronic Device Applications. 2018. Nierlly Galvão; Getulio Vasconcelos; Rodrigo Pessoa; João Machado; Marciel Guerino; Mariana Fraga; Bruno Rodrigues; et al. https://doi.org/10.20944/preprints201805.0441.v1.
    10.20944/preprints201805.0441.v1
  3. Applications of SiC-Based Thin Films in Electronic and MEMS Devices. 2012. Mariana Amorim; Rodrigo Savio; Marcos Massi; Homero Santiago. http://dx.doi.org/10.5772/50998.
    10.5772/50998