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William pursued a master’s degree at the Sao Paulo State University (UNESP/Rio Claro/Brazil -2012 - receiving the maximum possible grade: GPA 10.0/10.0 - with three peer-review articles published being one as the first author) studying hydrophobic Sonogels. From 2012 to 2016, William concluded his Ph.D. in Physics at Technological Institute of Aeronautics (ITA/ São José dos Campos/Brazil - GPA 9.13/10.0 - with four peer-review articles published being three as the first author), in the most prestigious military institution in Brazil with studies on atomic layer deposition (ALD) with titanium dioxide thin-films, being the first thesis in the ALD field in Latin America. Due to budget cuts by the Brazilian Government, he stopped his career between March of 2016 until March of 2017, a period of low scientific productivity. In 2017, William started with a lecturer position at Centro Universitário Adventista de São Paulo - Brazil, with responsibilities in several classes. Late in 2017, the researcher re-started his career at the University of São Paulo (USP) with a Postdoctoral Fellowship received an independent grant through competitive funding (success rate 5%) where William was the principal investigator (PI). Also, William participated as a jury in two juries of an academic degree of a master's degree and another of a doctoral degree at USP. As part of the project, he performed short research stay at the International Iberian Nanotechnology Laboratory (INL) at Nanofabrication for Optoelectronic Applications group, under the project “Passivation of Semiconductor interfaces for CIGS solar cells.” As dissemination, he participated in an interview on a TV show, namely, Educação at Novo tempo TV, talking about engineering and technology (2017). Also, he taught a course of dissemination of knowledge of Fabrication and Electrical Characterization of MOS Solar Cells at the University of São Paulo, for a general audience (2018). Projects: 1) he was the principal investigator (PI) of a Postdoctoral Fellowship at USP with the most prestigious Brazilian funding agency; namely, the Sao Paulo Research Foundation (FAPESP)- grant number 2016/17826-7 (budget 40k€) was about the fabrication of MOS solar cells based on silicon and dielectrics growth by ALD; and, 2) he is an associated researcher in the project: Synthesis and microbiological analysis of polymer substrates coated with TiO2 or Al2O3 ultra-thin films by atomic layer deposition technology - grant number 2018/01265-1 (budget 38k€) that was approved by FAPESP. (Technological Institute of Aeronautics (ITA)), two Brazilian universities (Universidade Brasil and the University of São Paulo). In June 2019, willing to increase his technological background, he decided to move to Europe. He started a second postdoctoral fellowship at the University of Aveiro - Portugal studying thin-films of kesterites (CZTS) or chalcopyrites (CIGS), using photoluminescence spectroscopy (PL), time-resolved photoluminescence, Raman spectroscopy, and measurements and analysis of conductivity results as a function of temperature. William track-record in proposal writing is outstanding as these shortlists of achievements demonstrate, considering the complex economic and social conditions that Brazil is currently facing. Furthermore, he has been collaborating with several international institutions and, he is active elaboration/management of individual projects, teaching, science dissemination through articles, books, open science, and seminars for all audiences.
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Identificação

Identificação pessoal

Nome completo
William Chiappim Junior

Nomes de citação

  • Chiappim Junior, William

Identificadores de autor

Ciência ID
A718-531F-43C9
ORCID iD
0000-0003-2615-2216
Researcher Id
J-3789-2016

Moradas

  • Rua João Carbonari Junior, 479 Apto 41 Bloco 23, 13210705, São Paulo, Jundiaí, Brasil (Pessoal)

Websites

Domínios de atuação

  • Ciências Exatas - Física

Idiomas

Idioma Conversação Leitura Escrita Compreensão Peer-review
Inglês Utilizador proficiente (C1) Utilizador proficiente (C1) Utilizador proficiente (C1) Utilizador proficiente (C1) Utilizador proficiente (C1)
Português (Idioma materno)
Espanhol; Castelhano Utilizador independente (B1) Utilizador proficiente (C1) Utilizador independente (B1) Utilizador independente (B1) Utilizador independente (B1)
Formação
Grau Classificação
2012/03/03 - 2016/06/16
Concluído
 Plasma Physics (Doctor)
Especialização em Plasma Physics
Instituto Tecnológico de Aeronáutica, Brasil
"Atomic Layer Deposition of TiO2: Morphological, Structural and Optical Study and Comparison between the Plasma and Thermal modes" (TESE/DISSERTAÇÃO)
 Ph.D in Plasma Physics
2010/03/03 - 2012/02/20
Concluído
 Applied Physics (Master)
Especialização em Applied Physics
Universidade Estadual Paulista Júlio de Mesquita Filho - Câmpus de Rio Claro, Brasil
"Synthesis of silica aerogels and xerogels with solvent exchange and drying at ambient pressure" (TESE/DISSERTAÇÃO)
 Master in Applied Physics
2004/03/03 - 2007/12/04
Concluído
 Physics (Bachelor)
Especialização em Física da Matéria Condensada
Universidade Estadual Paulista Júlio de Mesquita Filho - Câmpus de Rio Claro, Brasil
 Bachelor in Physics
Percurso profissional

Ciência

Categoria Profissional
Instituição de acolhimento 		Empregador
2019/06/05 - 2020/03/31 Pós-doutorado (Investigação) Universidade de Aveiro CICECO, Portugal
Universidade de Aveiro Departamento de Física, Portugal
2017/03/01 - 2019/02/28 Pós-doutorado (Investigação) Universidade de São Paulo, Brasil
2018/11/18 - 2018/12/18 Investigador visitante (Investigação) International Iberian Nanotechnology Laboratory, Portugal

Docência no Ensino Superior

Categoria Profissional
Instituição de acolhimento 		Empregador
2017/02/01 - 2017/05/02 Professor Associado (Docente Universitário) Centro Universitário Adventista de São Paulo, Brasil
2014/10/10 - 2016/01/10 Professor Associado Convidado (Docente Universitário) Universidade Estadual Paulista Júlio de Mesquita Filho - Câmpus de Guaratinguetá, Brasil
2012/06/07 - 2012/12/06 Assistente Estagiário (Docente Universitário) Instituto Tecnológico de Aeronáutica, Brasil
2010/10/01 - 2011/01/05 Professor Auxiliar Convidado (Docente Universitário) Universidade Estadual Paulista Júlio de Mesquita Filho Câmpus de Rio Claro Instituto de Geociências e Ciências Exatas, Brasil
Projetos

Bolsa

Designação Financiadores
2020/02 - 2025/01 Use of low temperature atmospheric pressure plasma in Dentistry: from laboratory bench to clinics
2019/05856-7
 Fundação de Amparo à Pesquisa do Estado de São Paulo
2020/11 - 2022/10 Exploring the potential of plasma activated liquid (PAL): characterization of plasma and application of PAL in endodontic treatment
2020/10450-7
 Fundação de Amparo à Pesquisa do Estado de São Paulo

Projeto

Designação Financiadores
2018/05 - 2020/04 Synthesis and microbiological analysis of polymer substrates coated with TiO2 and / or Al2O3 ultra-thin films by atomic layer deposition technology
2018/01265-1
 Fundação de Amparo à Pesquisa do Estado de São Paulo
2017/03/03 - 2019/02/28 Fabrication of MOS Solar Cells Using Structures Al/ALD TiO2/SiO2/Si
16/17826-7
Bolseiro de Pós-Doutoramento
Universidade de São Paulo Escola Politécnica, Brasil
 Fundação de Amparo à Pesquisa do Estado de São Paulo
Concluído
Produções

Publicações

Artigo em conferência
  1. Santos, Fernando L. N.; Watanabe, Marcos N.; Junior, William Chiappim; Filho, Sebastiao G. dos Santos; Martino, Joao A.. "Bifacial Tandem Solar Panels with MOS Cells on the Backside for Applications in Deserts". Trabalho apresentado em 2019 34th Symposium on Microelectronics Technology and Devices (SBMicro), São Paulo, 2019.
    Publicado • 10.1109/sbmicro.2019.8919381
  2. Watanabe, M.N.; Chiappim, W.; Christiano, V.; Filho, S.G.D.S.; Watanabe, Marcos N.; Chiappim, William; Christiano, Veronica; Filho, Sebastiao G. dos Santos. "MOS solar cells for indoor LED energy harvesting: Influence of the grating geometry and the thickness of the gate dielectrics". Trabalho apresentado em 2019 34th Symposium on Microelectronics Technology and Devices (SBMicro), São Paulo, 2019.
    Publicado • 10.1109/SBMicro.2019.8919375
  3. Junior, William. "Fabrication and Electrical Characterization of MOS Solar Cells for Energy Harvesting". 2018.
    10.1109/SBMicro.2018.8511579
  4. Junior, William. "On the influence of conductor, semiconductor and insulating substrate on the structure of atomic layer deposited titanium dioxide thin films". 2018.
    10.1109/SBMicro.2018.8511504
  5. Junior, William. "Synthesis of anatase and rutile phases of TiO2 by atomic layer deposition: Substrate effect". 2015.
    10.1109/SBMicro.2014.6940121
Artigo em revista
  1. Noala Milhan; William Chiappim Junior; Aline da Graça Sampaio; Mariana Raquel da Cruz Vegian; R.S. Pessoa; Cristiane Yumi Koga Ito. "Applications of Plasma-Activated Water in Dentistry: A Review". International Journal of Molecular Sciences (2022): https://www.mdpi.com/1422-0067/23/8/4131.
    10.3390/ijms23084131
  2. "The status and perspectives of nanostructured materials and fabrication processes for wearable piezoresistive sensors". Microsystem Technologies (2022): http://dx.doi.org/10.1007/s00542-022-05269-w.
    10.1007/s00542-022-05269-w
  3. Chiappim Junior, William. "Nebulized plasma-activated water has an effective antimicrobial effect on medically relevant microbial species and maintains its physicochemical properties in tube lengths from 0.1 up to 1.0¿m". Plasma Processes and Polymers (2021): http://dx.doi.org/10.1002/ppap.202100010.
    10.1002/ppap.202100010
  4. Chiappim Junior, William. "Antimicrobial Effect of Plasma-Activated Tap Water on Staphylococcus aureus, Escherichia coli, and Candida albicans". Water 13 11 (2021): 1480-1480. http://dx.doi.org/10.3390/w13111480.
    10.3390/w13111480
  5. William Chiappim Junior; Giorgio Testoni; F.S.Miranda; Mariana Amorim Fraga; Humber Furlan; David Ardiles Saravia; Argemiro Soares da Silva Sobrinho; et al. "Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating". Micromachines (2021): https://www.mdpi.com/2072-666X/12/6/588.
    10.3390/mi12060588
  6. Chiappim Junior, William. "Front passivation of Cu(In,Ga)Se2 solar cells using Al2O3: Culprits and benefits". Applied Materials Today 21 (2020): 100867-100867. http://dx.doi.org/10.1016/j.apmt.2020.100867.
    10.1016/j.apmt.2020.100867
  7. Chiappim Junior, William. "An Experimental and Theoretical Study of the Impact of the Precursor Pulse Time on the Growth Per Cycle and Crystallinity Quality of TiO2 Thin Films Grown by ALD and PEALD Technique". Frontiers in Mechanical Engineering 6 (2020): http://dx.doi.org/10.3389/fmech.2020.551085.
    10.3389/fmech.2020.551085
  8. Chiappim Junior, William. "Physicochemical Studies on the Surface of Polyamide 6.6 Fabrics Functionalized by DBD Plasmas Operated at Atmospheric and Sub-Atmospheric Pressures". Polymers (2020): http://dx.doi.org/10.3390/polym12092128.
    10.3390/polym12092128
  9. Dias, Vanessa; Chiappim, William; Fraga, Mariana Amorim; Maciel, Homero S; Marciano, Fernanda; Pessoa, Rodrigo S. "Atomic layer deposition of TiO2 and Al2O3 thin films for the electrochemical study of corrosion protection in aluminum alloy cans used in beverage". Materials Research Express 7 (2020): http://dx.doi.org/10.1088/2053-1591/aba557.
    Acesso aberto • Publicado • 10.1088/2053-1591/aba557
  10. Chiappim Junior, William. "Microwave Synthesis of Silver Sulfide and Silver Nanoparticles: Light and Time Influence". ACS Omega (2020): http://dx.doi.org/10.1021/acsomega.0c00656.
    10.1021/acsomega.0c00656
  11. Chiappim Junior, William. "MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion". Nanomaterials (2020): http://dx.doi.org/10.3390/nano10020338.
    10.3390/nano10020338
  12. Junior, William. "Influence of the Al2O3 partial-monolayer number on the crystallization mechanism of TiO2 in ALD TiO2/Al2O3 nanolaminates and its impact on the material properties". Journal of Physics D: Applied Physics (2016): http://iopscience.iop.org/article/10.1088/0022-3727/49/37/375301/meta.
    https://doi.org/10.1088/0022-3727/49/37/375301
  13. Junior, William. "Effect of process temperature and reaction cycle number on atomic layer deposition of TiO2 thin films using TiCl4 and H2O precursors: correlation between material properties and process environment". Brazilian Journal of Physics (2016): https://link.springer.com/article/10.1007/s13538-015-0383-2.
    https://doi.org/10.1007/s13538-015-0383-2
  14. Chiappim, W.; Testoni, G. E.; Doria, A. C.; Pessoa, R. S.; Fraga, M. A.; Galvão, N. K.; Grigorov, K. G.; Vieira, L.; Maciel, H. S.. "Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode". Nanotechnology 27 30 (2016): 305701-305701.
    10.1088/0957-4484/27/30/305701
  15. Chiappim, W.; Testoni, G. E.; Moraes, R. S.; Pessoa, R. S.; Sagás, J. C.; Origo, F. D.; Vieira, L.; et al. "Structural, morphological, and optical properties of TiO2 thin films grown by atomic layer deposition on fluorine doped tin oxide conductive glass". Vacuum 123 (2016): 91-102. http://www.scopus.com/inward/record.url?eid=2-s2.0-84964723096&partnerID=MN8TOARS.
    http://dx.doi.org/10.1016/j.vacuum.2015.10.019
  16. Testoni, G.E.; Chiappim, W.; Pessoa, R.S.; Fraga, M.A.; Miyakawa, W.; Sakane, K.K.; Galvão, N.K.A.M.; Vieira, L.; Maciel, H.S.. "Influence of the Al2O3 partial-monolayer number on the crystallization mechanism of TiO2 in ALD TiO2/Al2O3 nanolaminates and its impact on the material properties". Journal of Physics D: Applied Physics 49 37 (2016): http://www.scopus.com/inward/record.url?eid=2-s2.0-84989170509&partnerID=MN8TOARS.
    10.1088/0022-3727/49/37/375301
  17. Chiappim, W.; Testoni, G.E.; de Lima, J.S.B.; Medeiros, H.S.; Pessoa, R.S.; Grigorov, K.G.; Vieira, L.; Maciel, H.S.. "Effect of Process Temperature and Reaction Cycle Number on Atomic Layer Deposition of TiO2 Thin Films Using TiCl4 and H2O Precursors: Correlation Between Material Properties and Process Environment". Brazilian Journal of Physics 46 1 (2016): 56-69. http://www.scopus.com/inward/record.url?eid=2-s2.0-84953449438&partnerID=MN8TOARS.
    10.1007/s13538-015-0383-2
  18. Pessoa, R.S.; Pereira, F.P.; Testoni, G.E.; Chiappim, W.; Maciel, H.S.; Santos, L.V.. "Effect of substrate type on structure of TiO2thin film deposited by atomic layer deposition technique". Journal of Integrated Circuits and Systems 10 1 (2015): 38-42. http://www.scopus.com/inward/record.url?eid=2-s2.0-84941105352&partnerID=MN8TOARS.
  19. Chiappim, W.; Awano, C. M.; Donatti, D. A.; de Vicente, F. S.; Vollet, D. R.. "Structure of hydrophobic ambient-pressure-dried aerogels prepared by sonohydrolysis of tetraethoxysilane with additions of N,N-dimethylformamide". Langmuir 30 4 (2014): 1151-9.
    10.1021/la403798t
  20. Junior, William. "Dynamic Scaling and Growth Kinetics of 3-Glycidoxypropyltrimethosilane-Derived Organic/Silica Hybrids". Macromolecules (2011): https://pubs.acs.org/doi/abs/10.1021/ma1028483.
    10.1021/ma1028483
  21. Vollet, D.R.; Donatti, D.A.; Awano, C.M.; Chiappim, W.; Vicelli, M.R.; Ibãez Ruiz, A.; Junior, William. "Structure and aggregation kinetics of vinyl-triethoxysilane-derived organic/silica hybrids". Journal of Applied Crystallography 43 5 PART 1 (2010): 1005-1011. http://www.scopus.com/inward/record.url?eid=2-s2.0-77957347831&partnerID=MN8TOARS.
    10.1107/S0021889810030062
Capítulo de livro
  1. Chiappim Junior, William. "Atomic layer deposition of materials for solar water splitting". 363-380. Elsevier, 2021.
    10.1016/b978-0-12-821592-0.00015-7
  2. Chiappim Junior, William. "Novel dielectrics compounds grown by atomic layer deposition as sustainable materials for chalcogenides thin-films photovoltaics technologies". 71-100. Elsevier, 2021.
    10.1016/b978-0-12-821592-0.00020-0
  3. Junior, William. "Exploring the Properties and Fuel Cell Applications of Ultrathin Atomic Layer Deposited Metal Oxide Films". Reino Unido, 2018.
    https://doi.org/10.1016/B978-0-12-813794-9.00003-X
Livro
  1. Pessoa, R.S.; Fraga, M.A.; Chiappim, W.; Maciel, H.S.. Exploring the properties and fuel cell applications of ultrathin atomic layer deposited metal oxide films. 2018.
Recurso online
  1. Junior, William. A historical overview of the research on TiO2 thin films deposited by atomic layer deposition. 2017. https://figshare.com/articles/Manuscript_-_History_ALD_TiO2_part_I_-_v1_pdf/5469331/5.
    10.6084/m9.figshare.5469331.v5
Atividades

Apresentação oral de trabalho

Título da apresentação Nome do evento
Anfitrião (Local do evento)
2014/10/23 Uso da técnica de deposição por camada atômica para controle das propriedades de filmes finos de TiO2 aplicados em células solares sensibilizadas por corantes Ciência Para um Planeta Urbano. São Paulo, São José dos Campos, Brasil, 2014.
Universidade do Vale do Paraíba (São José dos Campos, Brasil)
2014/09/01 Synthesis of Anatase and Rutile Phases of TiO2 by Atomic Layer Deposition: Substrate Effect 29th Symposium on Microelectronics Technology and Devices- Sbmicro. Sergipe, Aracaju, Brasil, 2014
Universidade Federal de Sergipe (Aracaju, Brasil)
2014/06/15 Deposition of atomic layer deposition TiO2 thin films on FTO substrates aiming application in dye-sensitized solar cells 14th International Conference on Atomic Layer Deposition
University of Kyoto (Kyoto, Japão)
2014/06/15 Oxygen plasma power effect in TiO2 thin films prepared from Plasma-Enhanced Atomic Layer Deposition using Titanium (IV) Isopropoxide 14th International Conference on Atomic Layer Deposition
University of Kyoto (Kyoto, Japão)

Participação em evento

Descrição da atividade
Tipo de evento 		Nome do evento
Instituição / Organização
2016/09/03 - 2016/09/07 Poster Presentation: Comparison of mass spectrometry studies and physical/morphological properties of TiO2 thin films grown by atomic layer deposition using TiCl4 and water: Effect of precursor pulse time
Encontro
 Encontro de Física 2016
2016/07/25 - 2016/07/27 Poster Presentation: Plasma-assisted atomic layer deposition of TiO2 thin films: effect of direct plasma exposure during deposition on film structure and morphology
Conferência
 ANM 2016 - 7th International Conference on Advanced Nanomaterials
Universidade de Aveiro, Portugal
2016/07/24 - 2016/07/27 Poster Presentation: Optical properties of TiO2/Al2O3 nanolaminates comprising one Al2O3 partial-monolayer in each grown bi-layer
Conferência
 ALD 2016 IRELAND
2015/09/25 - 2015/10/01 Poster Presentation: Plasma enhanced atomic layer deposition of titanium dioxide thin films using halide and alkoxide precursors
Encontro
 XIV Encontro da SBPMat, 2015, Rio de Janeiro
2015/06/28 - 2015/07/01 Poster Presentation: Crystalline Phase Dependence of Atomic Layer Deposited TiO2 Thin Films on Different Substrates and Process Temperature
Conferência
 15th International Conference on Atomic Layer Deposition
2015/06/28 - 2015/07/01 Poster Presentation: Influence of Al2O3
Conferência
 15th International Conference on Atomic Layer Deposition
2015/06/28 - 2015/07/01 Poster Presentation: PEALD of TiO2 Thin Films Using Halide and Alkoxide Precursors: Correlation between Material Properties and Plasma Properties Extracted from Oxygen Global Model Simulation 15th International Conference on Atomic Layer Deposition
2015/06/28 - 2015/07/01 Poster Presentation: Study of the CF4 Capacitive Plasma Cycle of Atomic Layer Etching of Silicon-based Materials through Mass Spectrometry Technique and Global Model Simulation 15th International Conference on Atomic Layer Deposition
2015/05/03 - 2015/05/08 Poster Presentation: Multilayer thin films of Al2O3-TiO2 grown by atomic layer deposition
Congresso
 Brazilian Workshop on Semiconductor Physics: 17º BWSP
Universidade Federal de Uberlândia, Brasil
2014/07/15 - 2014/07/18 Poster Presentation: Comparison Between Structural and Morphological Properties of TiO2 Thin Films Growth by Magnetron Sputtering and Atomic Layer Deposition Techniques
Encontro
 IX EFITA - 9º Encontro de Física do ITA
2014/07/15 - 2014/07/18 Poster Presentation: Plasma-Enhanced Atomic Layer Deposition: A Powerful Technique to Control Thin Films Properties Aimed for Photoelectrochemical Solar Cell Applications
Encontro
 IX EFITA - 9º Encontro de Física do ITA

Júri de grau académico

Tema
Tipo de participação 		Nome do candidato (Tipo de grau)
Instituição / Organização
2018/10/19 Doctor Degree with the Title: Obtenção e Caracterização de Camadas de Telureto Dopados com Terras Raras para Conversão Descendente de Energia da Luz (Downconversion) Visando o Aumento do Rendimento de Conversão Luminosa em Células Solares MOS
Arguente
 Bárbara Siano Alândia (Doutoramento)
Universidade de São Paulo Escola Politécnica, Brasil
2018/09/03 Master Degree with the Title: FABRICAÇÃO E CARACTERIZAÇÃO DE CÉLULAS SOLARES MOS UTILIZANDO OXINITRETOS DE SILÍCIO
Arguente
 Marcos Norio Watanabe (Mestrado)
Universidade de São Paulo Escola Politécnica, Brasil

Curso / Disciplina lecionado

Disciplina Curso (Tipo) Instituição / Organização
2018/09/24 - 2018/10/06 Course of dissimination of knowledge of Fabrication and Electrical Characterization of MOS Solar Cells in University of São Paulo. Cultura e Extensão Universitária (Graduado) Universidade de São Paulo Escola Politécnica, Brasil
2017/02/01 - 2017/05/02 General Physics, Differential and Integral Calculus Computer Engineering (Bachelor) Centro Universitário Adventista de São Paulo - Campus São Paulo, Brasil
2014/10/10 - 2016/01/10 General Physics, Experimental Physics Civil, Mechanical, Electrical and Materials Engineering (Bachelor) Universidade Estadual Paulista Júlio de Mesquita Filho - Câmpus de Guaratinguetá, Brasil
2014/10/10 - 2016/01/10 Experimental Physics Physics (Licence) Universidade Estadual Paulista Júlio de Mesquita Filho - Câmpus de Guaratinguetá, Brasil

Entrevista / Programa (rádio / tv)

Programa Tema
2017/06/25 - 2017/06/25 Dissemination of Knowledge : Educação NT Engineering and Technology
Distinções

Prémio

2014 Melhor Trabalho na Área de Nanociência e Nanotecnologia Aplicada
Universidade do Vale do Paraiba, Brasil

Outra distinção

2018 Project/Grant number 2018/01265-1 (Synthesis and microbiological analysis of polymer substrates coated with TiO2 and/or Al2O3 ultra-thin films by atomic layer deposition technology)
Fundação de Amparo à Pesquisa do Estado de São Paulo, Brasil
2017 Individual Postdoctoral Fellowship - Grant number 2016/17826-7 (Fabrication of MOS Solar Cells Using Structures Al/ALD TiO2/SiO2/Si)
Fundação de Amparo à Pesquisa do Estado de São Paulo, Brasil
2015 First place in the public exam for substitute undergraduate professor in São Paulo State University for classes General Physics (Edict 10/2015-FEG/STDARH).
Universidade Estadual Paulista Júlio de Mesquita Filho - Câmpus de Rio Claro, Brasil
2014 First place in the public exam for substitute undergraduate professor in São Paulo State University for classes Experimental Physics (Edict 122/2014-FEG/STDARH)
Universidade Estadual Paulista Júlio de Mesquita Filho - Câmpus de Rio Claro, Brasil